Master in Microelectronics Technology and Manufacturing Management

Module 2.1 - Semiconductor Devices

2.1.1 - Introduction to Semiconductor Physics

Program focus
This 12-hour course reviews semiconductor properties, and is used as a basis for understanding and calculating device characteristics. Crystal structure, semiconductors, energy band, carrier distribution, and transport properties are presented with emphasis on silicon. A compilation of the most accurate values for this semiconductor is given in the illustrations.

Benefits
At the end of the course, you will be more effective in understanding and calculating characteristics for basic devices including diodes, transistors, and MOS capacitance.

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2.1.2 - Bipolar Device Physics

Program focus
This six-hour course covers calculation of the current (ideal and non ideal) in a PN junctions and basic description and modelling of bipolar transistors. It first looks at the ideal current in a PN junction (Schockley law) and then describes all non-ideal effects (short diode, recombination/generation, high injection, series resistance, breakdown). It is followed by a description of bipolar transistors and their operating mode, a basic modelling of DC currents through the BJT and finally a short overview of the main issues and advances of bipolar technology (SiGe, HBT…).

Benefits
At the end of this course, you will know the basics of bipolar integrated circuit processing.

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2.1.3 - Physics of Metal Oxide Semiconductor (MOS) Devices and of the Field Effect Transistor (MOSFET)

Program focus
This 12-hour course provides an overview including some basic principles from physics, theory of operation for MOS–based devices and a first electrical model used for the MOSFET. It first focuses on the MOS capacitor and the various regimes of the structure, explicating the capacitance-voltage characteristics of the ideal MOS diode, and develops the calculation of the threshold voltage of the MOSFET. Then, a first electrical model of the MOSFET based on the gradual channel approximation is presented. The physical limitations and advanced effects in MOSFETs (including associated electrical problems) are finally described.

Benefits
At the end of this course, you will have understood the MOS and MOSFET operation and got some physical insight in the meaning of physical and electrical parameters used in CAD models.

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2.1.4 - Electrical Characterization in Microelectronics

Program focus
This 6-hour course is a presentation of the main basic experimental electrical measurements used to characterize semiconductors and devices. The first part deals with the measurement methods of conduction parameters, such as resistivity and carrier concentration. The second part focuses on the C(V) technique,  widely used both for parameter extraction and for substrate, interface or oxide defects characterization in MOS structures. Finally, lifetime measurement techniques are presented.

Benefits
At the end of this course, you will know basic semiconductor, oxide and MOS device electrical measurement techniques currently used in as characterization tools in the semiconductor industry.

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2.1.5 - Electrical Device Modeling

Program focus
This 12-hour course establishes the electrical models used for bipolar (PN junction & Bipolar Junction Transistor BJT) and MOS (capacitor and MOSFET) devices. Starting from basic knowledge in physics of semiconductors and the description of the structure, it will establish the most frequently used ideal and non-ideal laws used in these models, and will discuss DC and AC representations. Finally, the SPICE representation of these models will be presented.

Benefits
At the end of this course, you will understand the physical meaning and implications of the terms involved in the electrical models used in simulators and be able to estimate their influence on the characteristics of the device.
You will be able to link physical and technological parameters and their electrical consequences.

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2.1.6 - Submicron Device

Program focus
The 12 hours course deals with the scaling of submicron MOSFET’s. After an introduction to the short channel effects, the peculiar features of the carrier transport in scaled MOSFET’s will be highlighted and quantitatively assessed. The historical evolution of the MOSFET scaling is reviewed. Starting from the first attempts to give a theoretical basis to the scaling strategy the most important steps of the device evolution will be discussed. As the MOSFET enters in the deep submicron regime, quantum effects become relevant and have direct impact on the device performance. They are addressed and the structures of advanced devices will be described. The last section is then devoted to the operation and performance of ultimate decanano MOSFET’s

Benefits
- Developing quantitative understanding of advanced MOSFET’s performance
- Appreciate the novel trends in deca-nanometer CMOS technologies.

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